Nonlinear optical properties of metal-nitride thin films

Paul M. Lundquist*, Weiping Lin, John B. Ketterson, George K. Wong, Long D. Zhu, Peter E. Norris

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Robust second-order optical nonlinearities comparable to those in common nonlinear optical materials have been reported in metal nitrides. In this paper we present experimental studies of gallium nitride and aluminum nitride thin films, including fabrication and optical characterization. The ease of thin film deposition techniques employed for these materials indicate that they may have potential for cost effective development of nonlinear optical waveguide devices.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages304-310
Number of pages7
ISBN (Print)0819417440, 9780819417442
DOIs
StatePublished - 1995
EventOptoelectronic Integrated Circuit Materials, Physics, and Devices - San Jose, CA, USA
Duration: Feb 6 1995Feb 9 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2397
ISSN (Print)0277-786X

Other

OtherOptoelectronic Integrated Circuit Materials, Physics, and Devices
CitySan Jose, CA, USA
Period2/6/952/9/95

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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