On-chip intra- and inter-layer grating couplers for three-dimensional integration of silicon photonics

Yang Zhang*, David Kwong, Xiaochuan Xu, Amir Hosseini, Sang Y. Yang, John A. Rogers, Ray T. Chen

*Corresponding author for this work

Research output: Contribution to journalArticle

29 Scopus citations

Abstract

We present on-chip intra- and inter-layer grating couplers fabricated on double-layer, single crystalline silicon nanomembranes. The silicon nanomembranes were fabricated using an adhesive bonding process. The grating couplers are based on subwavelength nanostructures operating at the transverse-electric polarization. Such nanostructures can be patterned in a single lithography/etching process. Simultaneous intra-layer coupling to separate silicon photonic layers is demonstrated through grating couplers with peak efficiencies of 18% and 44% per grating coupler for bottom and top layer, respectively, at 1550 nm wavelength. The inter-layer grating coupler has an efficiency of 25% at 1560 nm wavelength with a 3 dB bandwidth of 41 nm.

Original languageEnglish (US)
Article number211109
JournalApplied Physics Letters
Volume102
Issue number21
DOIs
StatePublished - Jun 24 2013

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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