One-step patterning of aligned nanowire arrays by programmed dip coating

Jiaxing Huang; Rong Fan; Stephen Connor; Peidong Yang

doi:10.1002/anie.200604789

One-step patterning of aligned nanowire arrays by programmed dip coating

Jiaxing Huang^*, Rong Fan, Stephen Connor, Peidong Yang

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

151 Scopus citations

Abstract

Dip, stick, slip: Dip coating, a widely used industrial process for making thin films, is used to align and position nanowires by means of the stick-slip motion of the solvent meniscus. Nanowire arrays with predefined spacing can be readily "printed" on a large substrate with tunable wire density (see picture), thus providing a facile method for producing nanowire-based devices. (Figure Presented).

Original language	English (US)
Pages (from-to)	2414-2417
Number of pages	4
Journal	Angewandte Chemie - International Edition
Volume	46
Issue number	14
DOIs	https://doi.org/10.1002/anie.200604789
State	Published - 2007

Keywords

Capillary flow
Dewetting
Interfaces
Nanotechnology
Patterning

ASJC Scopus subject areas

General Chemistry
Catalysis

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10.1002/anie.200604789

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@article{32827e2dd59642a3aa21679255c58fb7,

title = "One-step patterning of aligned nanowire arrays by programmed dip coating",

abstract = "Dip, stick, slip: Dip coating, a widely used industrial process for making thin films, is used to align and position nanowires by means of the stick-slip motion of the solvent meniscus. Nanowire arrays with predefined spacing can be readily {"}printed{"} on a large substrate with tunable wire density (see picture), thus providing a facile method for producing nanowire-based devices. (Figure Presented).",

keywords = "Capillary flow, Dewetting, Interfaces, Nanotechnology, Patterning",

author = "Jiaxing Huang and Rong Fan and Stephen Connor and Peidong Yang",

year = "2007",

doi = "10.1002/anie.200604789",

language = "English (US)",

volume = "46",

pages = "2414--2417",

journal = "Angewandte Chemie - International Edition",

issn = "1433-7851",

publisher = "John Wiley and Sons Ltd",

number = "14",

}

TY - JOUR

T1 - One-step patterning of aligned nanowire arrays by programmed dip coating

AU - Huang, Jiaxing

AU - Fan, Rong

AU - Connor, Stephen

AU - Yang, Peidong

PY - 2007

Y1 - 2007

N2 - Dip, stick, slip: Dip coating, a widely used industrial process for making thin films, is used to align and position nanowires by means of the stick-slip motion of the solvent meniscus. Nanowire arrays with predefined spacing can be readily "printed" on a large substrate with tunable wire density (see picture), thus providing a facile method for producing nanowire-based devices. (Figure Presented).

AB - Dip, stick, slip: Dip coating, a widely used industrial process for making thin films, is used to align and position nanowires by means of the stick-slip motion of the solvent meniscus. Nanowire arrays with predefined spacing can be readily "printed" on a large substrate with tunable wire density (see picture), thus providing a facile method for producing nanowire-based devices. (Figure Presented).

KW - Capillary flow

KW - Dewetting

KW - Interfaces

KW - Nanotechnology

KW - Patterning

UR - http://www.scopus.com/inward/record.url?scp=34250863874&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34250863874&partnerID=8YFLogxK

U2 - 10.1002/anie.200604789

DO - 10.1002/anie.200604789

M3 - Article

C2 - 17328024

AN - SCOPUS:34250863874

SN - 1433-7851

VL - 46

SP - 2414

EP - 2417

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

IS - 14

ER -

One-step patterning of aligned nanowire arrays by programmed dip coating

Abstract

Keywords

ASJC Scopus subject areas

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