Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography

W. Wu*, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, N. Fang, Y. R. Shen, A. M. Bratkovsky, W. Tong, C. Sun, X. Zhang, S. Y. Wang, R. S. Williams

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

78 Scopus citations

Abstract

Two types of optical metamaterials operating at near-IR and mid-IR frequencies, respectively, have been designed, fabricated by nanoimprint lithography (NIL), and characterized by laser spectroscopic ellipsometry. The structure for the near-IR range was a metal/dielectric/metal stack "fishnet" structure that demonstrated negative permittivity and permeability in the same frequency region and hence exhibited a negative refractive index at a wavelength near 1.7 μm. In the mid-IR range, the metamaterial was an ordered array of fourfold symmetric L-shaped resonators (LSRs) that showed both a dipole plasmon resonance resulting in negative permittivity and a magnetic resonance with negative permeability near wavelengths of 3.7 μm and 5.25 μm, respectively. The optical properties of both metamaterials are in agreement with theoretical predictions. This work demonstrates the feasibility of designing various optical negative-index metamaterials and fabricating them using the nanoimprint lithography as a low-cost, high-throughput fabrication approach.

Original languageEnglish (US)
Pages (from-to)143-150
Number of pages8
JournalApplied Physics A: Materials Science and Processing
Volume87
Issue number2
DOIs
StatePublished - May 2007

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

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