Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography

W. Wu*, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, N. Fang, Y. R. Shen, A. M. Bratkovsky, W. Tong, C. Sun, X. Zhang, S. Y. Wang, R. S. Williams

*Corresponding author for this work

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Chemical Compounds

Engineering & Materials Science