Optical properties of GaN epitaxial films grown by low-pressure chemical vapor epitaxy using a new nitrogen source: Hydrazoic acid (HN3)

Y. Bu*, M. C. Lin, L. P. Fu, D. G. Chtchekine, G. D. Gilliland, Y. Chen, S. E. Ralph, S. R. Stock

*Corresponding author for this work

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Physics & Astronomy