Optical properties of micromachined polysilicon reflective surfaces with etching holes

Jun Zou*, Colin Byrne, Chang Liu, David Brady

*Corresponding author for this work

Research output: Contribution to journalConference article

5 Scopus citations

Abstract

MUMPS (Multi-User MEMS Process) is receiving increasingly wide use in micro optics. We have investigated the optical properties of the polysilicon reflective surface in a typical MUMPS chip within the visible light spectrum. The effect of etching holes on the reflected laser beam is studied. The reflectivity and diffraction patterns at five different wavelengths have been measured. The optical properties of the polysilicon reflective surface are greatly affected by the surface roughness, the etching holes, as well as the material. The etching holes contribute to diffraction and reduction of reflectivity. This study provides a basis for optimal design of micromachined free-space optical systems.

Original languageEnglish (US)
Pages (from-to)307-314
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3511
DOIs
StatePublished - 1998
EventMicromachining and Microfabrication Process Technology IV - Santa Clara, CA, United States
Duration: Sep 21 1998Sep 22 1998

Keywords

  • Diffraction
  • MUMPS
  • Optical properties
  • Reflectivity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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