@article{5f49a019159c4cabaa82e0799be29e11,
title = "Optimization of graphene dry etching conditions via combined microscopic and spectroscopic analysis",
abstract = "Single-layer graphene structures and devices are commonly defined using reactive ion etching and plasma etching with O2 or Ar as the gaseous etchants. Although optical microscopy and Raman spectroscopy are widely used to determine the appropriate duration of dry etching, additional characterization with atomic force microscopy (AFM) reveals that residual graphene and/or etching byproducts persist beyond the point where the aforementioned methods suggest complete graphene etching. Recognizing that incomplete etching may have deleterious effects on devices and/or downstream processing, AFM characterization is used here to determine optimal etching conditions that eliminate graphene dry etching residues.",
author = "Prado, {Mariana C.} and Deep Jariwala and Marks, {Tobin J.} and Hersam, {Mark C.}",
note = "Funding Information: The authors thank Nacional de Grafite for the natural graphite used for exfoliation. This research was supported by the Materials Research Science and Engineering Center (MRSEC) of Northwestern University (NSF DMR-1121262) and by the Office of Naval Research (ONR N00014-11-1-0463). In addition, M.C.P. and M.C.H. acknowledge a CAPES Scholarship (Process Number 5456-11-8) and W. M. Keck Science and Engineering Grant, respectively. This research made use of the NUANCE Center at Northwestern University, which is supported by NSF-NSEC, NSF-MRSEC, Keck Foundation, and the State of Illinois. This research also utilized the NUFAB clean room facility at Northwestern University.",
year = "2013",
month = may,
day = "13",
doi = "10.1063/1.4807425",
language = "English (US)",
volume = "102",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "19",
}