Abstract
A single-cathode magnetron sputtering system was used to deposit CNx and CNx/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CNx/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.
Original language | English (US) |
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Pages (from-to) | 586-591 |
Number of pages | 6 |
Journal | Surface and Coatings Technology |
Volume | 86-87 |
Issue number | PART 2 |
DOIs | |
State | Published - Dec 15 1996 |
Funding
This work was supportedp artially by the National Science Foundation under Grant No. CMS-952035 (Program managerD: r. Jorn Larsen-Bassea) nd by the Center for Engineering Tribology at Northwestern University. The authors would also like to thank Kumamoto University in Japan for supporting Y. Marumo during his stay at NorthwesternU niversity.
Keywords
- CN/TiN coating
- Carbon nitride coating
- Single-cathode magnetron sputtering
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry