Optimization of properties of carbon nitride and CNx/TiN coatings prepared by single-cathode magnetron sputtering

Yasuo Marumo*, Zunde Yang, Yip Wah Chung

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Scopus citations


A single-cathode magnetron sputtering system was used to deposit CNx and CNx/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CNx/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.

Original languageEnglish (US)
Pages (from-to)586-591
Number of pages6
JournalSurface and Coatings Technology
Issue numberPART 2
StatePublished - Dec 15 1996


  • CN/TiN coating
  • Carbon nitride coating
  • Single-cathode magnetron sputtering

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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