Optimization of properties of carbon nitride and CNx/TiN coatings prepared by single-cathode magnetron sputtering

Yasuo Marumo; Zunde Yang; Yip Wah Chung

doi:10.1016/S0257-8972(96)03008-3

Optimization of properties of carbon nitride and CN_x/TiN coatings prepared by single-cathode magnetron sputtering

Yasuo Marumo^*, Zunde Yang, Yip Wah Chung

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

A single-cathode magnetron sputtering system was used to deposit CN_x and CN_x/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CN_x/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.

Original language	English (US)
Pages (from-to)	586-591
Number of pages	6
Journal	Surface and Coatings Technology
Volume	86-87
Issue number	PART 2
DOIs	https://doi.org/10.1016/S0257-8972(96)03008-3
State	Published - Dec 15 1996

Funding

This work was supportedp artially by the National Science Foundation under Grant No. CMS-952035 (Program managerD: r. Jorn Larsen-Bassea) nd by the Center for Engineering Tribology at Northwestern University. The authors would also like to thank Kumamoto University in Japan for supporting Y. Marumo during his stay at NorthwesternU niversity.

Keywords

CN/TiN coating
Carbon nitride coating
Single-cathode magnetron sputtering

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/S0257-8972(96)03008-3

Cite this

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title = "Optimization of properties of carbon nitride and CNx/TiN coatings prepared by single-cathode magnetron sputtering",

abstract = "A single-cathode magnetron sputtering system was used to deposit CNx and CNx/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CNx/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.",

keywords = "CN/TiN coating, Carbon nitride coating, Single-cathode magnetron sputtering",

author = "Yasuo Marumo and Zunde Yang and Chung, {Yip Wah}",

note = "Funding Information: This work was supportedp artially by the National Science Foundation under Grant No. CMS-952035 (Program managerD: r. Jorn Larsen-Bassea) nd by the Center for Engineering Tribology at Northwestern University. The authors would also like to thank Kumamoto University in Japan for supporting Y. Marumo during his stay at NorthwesternU niversity.",

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AU - Marumo, Yasuo

AU - Yang, Zunde

AU - Chung, Yip Wah

N1 - Funding Information: This work was supportedp artially by the National Science Foundation under Grant No. CMS-952035 (Program managerD: r. Jorn Larsen-Bassea) nd by the Center for Engineering Tribology at Northwestern University. The authors would also like to thank Kumamoto University in Japan for supporting Y. Marumo during his stay at NorthwesternU niversity.

PY - 1996/12/15

Y1 - 1996/12/15

N2 - A single-cathode magnetron sputtering system was used to deposit CNx and CNx/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CNx/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.

AB - A single-cathode magnetron sputtering system was used to deposit CNx and CNx/TiN coatings onto Si (100) and polished M2 substrates. It was shown that optimum choice of substrate bias and pressure is required to obtain smooth films with maximum hardness and wear performance for carbon nitride. This work shows that it is possible to obtain CNx/TiN composite films using the same single-cathode approach, although the C/Ti ratio required to achieve the best hardness and wear properties has yet to be optimized.

KW - CN/TiN coating

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