Optimized conditions for imaging the effects of bonding charge density in electron microscopy

J. Ciston; J. S. Kim; S. J. Haigh; A. I. Kirkland; L. D. Marks

doi:10.1016/j.ultramic.2010.12.003

Optimized conditions for imaging the effects of bonding charge density in electron microscopy

J. Ciston^*, J. S. Kim, S. J. Haigh, A. I. Kirkland, L. D. Marks

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

We report on the observability of valence bonding effects in aberration-corrected high resolution electron microscopy (HREM) images along the [010] projection of the mineral Forsterite (Mg₂SiO₄). We have also performed exit wave restorations using simulated noisy images and have determined that both the intensities of individual images and the modulus of the restored complex exit wave are most sensitive to bonding effects at a level of 25% for moderately thick samples of 20-25nm. This relatively large thickness is due to dynamical amplification of bonding contrast arising from partial de-channeling of 1s states. Simulations also suggest that bonding contrast is similarly high for an un-corrected conventional electron microscope, implying an experimental limitation of signal to noise ratio rather than spatial resolution.

Original language	English (US)
Pages (from-to)	901-911
Number of pages	11
Journal	Ultramicroscopy
Volume	111
Issue number	7
DOIs	https://doi.org/10.1016/j.ultramic.2010.12.003
State	Published - Jun 2011

Keywords

Bonding
Charge density
HREM
Multislice

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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10.1016/j.ultramic.2010.12.003

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@article{b2fe876322ec4b2793b597f56459069f,

title = "Optimized conditions for imaging the effects of bonding charge density in electron microscopy",

abstract = "We report on the observability of valence bonding effects in aberration-corrected high resolution electron microscopy (HREM) images along the [010] projection of the mineral Forsterite (Mg2SiO4). We have also performed exit wave restorations using simulated noisy images and have determined that both the intensities of individual images and the modulus of the restored complex exit wave are most sensitive to bonding effects at a level of 25% for moderately thick samples of 20-25nm. This relatively large thickness is due to dynamical amplification of bonding contrast arising from partial de-channeling of 1s states. Simulations also suggest that bonding contrast is similarly high for an un-corrected conventional electron microscope, implying an experimental limitation of signal to noise ratio rather than spatial resolution.",

keywords = "Bonding, Charge density, HREM, Multislice",

author = "J. Ciston and Kim, {J. S.} and Haigh, {S. J.} and Kirkland, {A. I.} and Marks, {L. D.}",

note = "Funding Information: This work was supported in part by the NSF Materials World Network program through DMR-0710643 (JC and LDM), and EPSRC grant EP/F028784/1 (AIK, JSK). ",

year = "2011",

month = jun,

doi = "10.1016/j.ultramic.2010.12.003",

language = "English (US)",

volume = "111",

pages = "901--911",

journal = "Ultramicroscopy",

issn = "0304-3991",

publisher = "Elsevier",

number = "7",

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T1 - Optimized conditions for imaging the effects of bonding charge density in electron microscopy

AU - Ciston, J.

AU - Kim, J. S.

AU - Haigh, S. J.

AU - Kirkland, A. I.

AU - Marks, L. D.

N1 - Funding Information: This work was supported in part by the NSF Materials World Network program through DMR-0710643 (JC and LDM), and EPSRC grant EP/F028784/1 (AIK, JSK).

PY - 2011/6

Y1 - 2011/6

N2 - We report on the observability of valence bonding effects in aberration-corrected high resolution electron microscopy (HREM) images along the [010] projection of the mineral Forsterite (Mg2SiO4). We have also performed exit wave restorations using simulated noisy images and have determined that both the intensities of individual images and the modulus of the restored complex exit wave are most sensitive to bonding effects at a level of 25% for moderately thick samples of 20-25nm. This relatively large thickness is due to dynamical amplification of bonding contrast arising from partial de-channeling of 1s states. Simulations also suggest that bonding contrast is similarly high for an un-corrected conventional electron microscope, implying an experimental limitation of signal to noise ratio rather than spatial resolution.

AB - We report on the observability of valence bonding effects in aberration-corrected high resolution electron microscopy (HREM) images along the [010] projection of the mineral Forsterite (Mg2SiO4). We have also performed exit wave restorations using simulated noisy images and have determined that both the intensities of individual images and the modulus of the restored complex exit wave are most sensitive to bonding effects at a level of 25% for moderately thick samples of 20-25nm. This relatively large thickness is due to dynamical amplification of bonding contrast arising from partial de-channeling of 1s states. Simulations also suggest that bonding contrast is similarly high for an un-corrected conventional electron microscope, implying an experimental limitation of signal to noise ratio rather than spatial resolution.

KW - Bonding

KW - Charge density

KW - HREM

KW - Multislice

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DO - 10.1016/j.ultramic.2010.12.003

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AN - SCOPUS:80053051503

SN - 0304-3991

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EP - 911

JO - Ultramicroscopy

JF - Ultramicroscopy

IS - 7

ER -

Optimized conditions for imaging the effects of bonding charge density in electron microscopy

Abstract

Keywords

ASJC Scopus subject areas

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