Optimizing Electron Ptychography for Advanced Characterization of Soft/Hard Interfaces

Roberto dos Reis*, Xiaobing Hu, Daniel G. Stroppa, Vinayak Dravid

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish (US)
Pages (from-to)1918-1919
Number of pages2
JournalMicroscopy and Microanalysis
Volume30
Issue number2024
DOIs
StatePublished - Jul 24 2024
Event82nd Annual Meeting Microscopy Society of America and the 58th Annual Meeting Microanalysis Society, M and M 2024 - Cleveland, United States
Duration: Jul 28 2024Aug 1 2024

Funding

This work made use of the EPIC facility of Northwestern University\u2019s NUANCE Center, which has received support from the SHyNE Resource (NSF ECCS-2025633), the IIN, and Northwestern\u2019s MRSEC program (NSF DMR-2308691). This research was supported in part through the computational resources and staff contributions provided for the Quest high performance computing facility at Northwestern University which is jointly supported by the Office of the Provost, the Office for Research, and Northwestern University Information Technology.

ASJC Scopus subject areas

  • Instrumentation

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