Organometallic chemical vapor deposition of high Tc superconducting Bi-Sr-Ca-Cu-O films

Jiming Zhang*, Jing Zhao, Henry O. Marcy, Lauren M. Tonge, Bruce W. Wessels, Tobin J. Marks, Carl R. Kannewurf

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

61 Scopus citations


Films of the high Tc Bi-Sr-Ca-Cu-O superconductor have been prepared by organometallic chemical vapor deposition using the volatile metalorganic precursors Cu(acetylacetonate)2, Sr(dipivaloylmethanate) 2, and Ca(dipivaloylmethanate)2, and triphenylbismuth. Deposition is carried out at 2 Torr with argon as the carrier gas and oxygen and water vapor as reactants. Film growth rates of 2-3 μm/h are achieved. After annealing under oxygen, energy dispersive x-ray analysis and x-ray diffraction data reveal that such films on [100] single-crystal MgO consist predominantly of the Bi2(Sr,Ca)3Cu2Ox, T c=85 K, phase and have preferential orientation of the crystallite c axes perpendicular to the substrate surface. Four-probe resistivity measurements reveal the onset of film superconductivity at ∼110 K and zero resistance by 75 K.

Original languageEnglish (US)
Pages (from-to)1166-1168
Number of pages3
JournalApplied Physics Letters
Issue number12
StatePublished - 1989

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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