Abstract
SrTiO3 thin films were deposited by low-pressure organometallic chemical vapor deposition. Titanium isopropoxide, Sr(dipivaloylmethanate) 2, oxygen, and water vapor were used as reactants, and argon was used as a carrier gas. Growth rates ranging from 0.3 to 4.5 μm/h were obtained on (0001) sapphire substrates at 600-850 °C. Highly textured SrTiO3 films with a [111] orientation were obtained at a growth temperature of 800 °C. The growth parameters which influenced the composition, phase stability, morphology, and texture of the thin films were examined.
Original language | English (US) |
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Pages (from-to) | 3858-3861 |
Number of pages | 4 |
Journal | Journal of Applied Physics |
Volume | 67 |
Issue number | 8 |
DOIs | |
State | Published - 1990 |
ASJC Scopus subject areas
- General Physics and Astronomy