Organometallic chemical vapor deposition routes to high Tc superconducting Tl-Ba-Ca-Cu-O films

Darrin S. Richeson*, Lauren M. Tonge, Jing Zhao, Jiming Zhang, Henry O. Marcy, Tobin J. Marks, Bruce W. Wessels, Carl R. Kannewurf

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

67 Scopus citations


Films of the Tl-Ba-Ca-Cu-O high Tc superconductor can be prepared by either of two organometallic chemical vapor deposition routes. Ba-Ca-Cu-O films are first prepared on yttria-stabilized zirconia using the volatile precursors Ba(heptafluorodimethyloctanedionate)2, Ca(dipivaloylmethanate)2, and Cu(acetylacetonate)2. Deposition is carried out at 5 Torr pressure with argon as the carrier gas and water vapor as the reactant gas. Thallium is next incorporated in these films either by vapor diffusion using bulk Tl-Ba-Ca-Cu-O as the source, or by organometallic chemical vapor deposition using Tl(cyclopentadienide) as the source. The latter deposition is carried out at atmospheric pressure with an argon carrier and water-saturated oxygen reactant, followed by rapid thermal annealing. Both types of films consist primarily of the TlBa2Ca2Cu 3Ox phase, have preferential orientation of the CuO planes parallel to the substrate surface, and exhibit onset of superconductivity at ∼120 K with zero resistance by 100 K.

Original languageEnglish (US)
Pages (from-to)2154-2156
Number of pages3
JournalApplied Physics Letters
Issue number21
StatePublished - 1989

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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