Passive and active probe arrays for Dip-Pen Nanolithography

Ming Zhang, David Bullen, Kee S. Ryu, Chang Liu, Seunghun Hong, Sung Wook Chung, Chad A. Mirkin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations

Abstract

The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100nm patterns in a high speed, parallel, and controllable fashion.

Original languageEnglish (US)
Title of host publicationProceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
PublisherIEEE Computer Society
Pages27-31
Number of pages5
Volume2001-January
ISBN (Electronic)0780372158
DOIs
StatePublished - Jan 1 2001
Event1st IEEE Conference on Nanotechnology, IEEE-NANO 2001 - Maui, United States
Duration: Oct 28 2001Oct 30 2001

Other

Other1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
CountryUnited States
CityMaui
Period10/28/0110/30/01

ASJC Scopus subject areas

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

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