Passive and active probe arrays for Dip-Pen Nanolithography

Ming Zhang; David Bullen; Kee S. Ryu; Chang Liu; Seunghun Hong; Sung Wook Chung; Chad A. Mirkin

doi:10.1109/NANO.2001.966387

Passive and active probe arrays for Dip-Pen Nanolithography

Ming Zhang, David Bullen, Kee S. Ryu, Chang Liu, Seunghun Hong, Sung Wook Chung, Chad A. Mirkin

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

8 Scopus citations

Abstract

The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100nm patterns in a high speed, parallel, and controllable fashion.

Original language	English (US)
Title of host publication	Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
Publisher	IEEE Computer Society
Pages	27-31
Number of pages	5
ISBN (Electronic)	0780372158
DOIs	https://doi.org/10.1109/NANO.2001.966387
State	Published - 2001
Event	1st IEEE Conference on Nanotechnology, IEEE-NANO 2001 - Maui, United States Duration: Oct 28 2001 → Oct 30 2001

Publication series

Name	Proceedings of the IEEE Conference on Nanotechnology
Volume	2001-January
ISSN (Print)	1944-9399
ISSN (Electronic)	1944-9380

Other

Other	1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
Country/Territory	United States
City	Maui
Period	10/28/01 → 10/30/01

ASJC Scopus subject areas

Bioengineering
Electrical and Electronic Engineering
Materials Chemistry
Condensed Matter Physics

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10.1109/NANO.2001.966387

Cite this

Zhang, M., Bullen, D., Ryu, K. S., Liu, C., Hong, S., Chung, S. W., & Mirkin, C. A. (2001). Passive and active probe arrays for Dip-Pen Nanolithography. In Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001 (pp. 27-31). Article 966387 (Proceedings of the IEEE Conference on Nanotechnology; Vol. 2001-January). IEEE Computer Society. https://doi.org/10.1109/NANO.2001.966387

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title = "Passive and active probe arrays for Dip-Pen Nanolithography",

abstract = "The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100nm patterns in a high speed, parallel, and controllable fashion.",

author = "Ming Zhang and David Bullen and Ryu, {Kee S.} and Chang Liu and Seunghun Hong and Chung, {Sung Wook} and Mirkin, {Chad A.}",

note = "Publisher Copyright: {\textcopyright} 2001 IEEE.; 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001 ; Conference date: 28-10-2001 Through 30-10-2001",

year = "2001",

doi = "10.1109/NANO.2001.966387",

language = "English (US)",

series = "Proceedings of the IEEE Conference on Nanotechnology",

publisher = "IEEE Computer Society",

pages = "27--31",

booktitle = "Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001",

address = "United States",

}

Zhang, M, Bullen, D, Ryu, KS, Liu, C, Hong, S, Chung, SW & Mirkin, CA 2001, Passive and active probe arrays for Dip-Pen Nanolithography. in Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001., 966387, Proceedings of the IEEE Conference on Nanotechnology, vol. 2001-January, IEEE Computer Society, pp. 27-31, 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001, Maui, United States, 10/28/01. https://doi.org/10.1109/NANO.2001.966387

Passive and active probe arrays for Dip-Pen Nanolithography. / Zhang, Ming; Bullen, David; Ryu, Kee S. et al.
Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001. IEEE Computer Society, 2001. p. 27-31 966387 (Proceedings of the IEEE Conference on Nanotechnology; Vol. 2001-January).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Passive and active probe arrays for Dip-Pen Nanolithography

AU - Zhang, Ming

AU - Bullen, David

AU - Ryu, Kee S.

AU - Liu, Chang

AU - Hong, Seunghun

AU - Chung, Sung Wook

AU - Mirkin, Chad A.

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AB - The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100nm patterns in a high speed, parallel, and controllable fashion.

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BT - Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001

PB - IEEE Computer Society

T2 - 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001

Y2 - 28 October 2001 through 30 October 2001

ER -

Passive and active probe arrays for Dip-Pen Nanolithography

Abstract

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ASJC Scopus subject areas

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