Patterned Self-Assembled Monolayers Formed by Microcontact Printing Direct Selective Metalization by Chemical Vapor Deposition on Planar and Nonplanar Substrates

Noo Li Jeon, Ralph G. Nuzzo, Younan Xia, Milan Mrksich, George M. Whitesides

Research output: Contribution to journalArticlepeer-review

166 Scopus citations

Abstract

Self-assembled monolayers (SAMs) of alkylsiloxanes were patterned by microcontact printing (μCP) on a number of substrates: Al/Al2O3, Si/SiO2, TiN/TiO2, glasses, indium tin oxide (ITO), and plasma-modified polyimide. The patterned SAMs on these surfaces define and direct the selective chemical vapor deposition (CVD) of copper using (hexafluoroacetylacetonato)(vinyltrimethylsilane)copper(I) (CuI(hfac)(vtms)) as the source gas. This paper presents several examples of microstructures of copper fabricated by selective, SAM-directed CVD, including fabrication of thin-film interconnects (with feature sizes of 0.5–100 μm), and selective filling of trenches and vias (models of microstructures having high aspect ratios) with feature sizes below 1 μm.

Original languageEnglish (US)
Pages (from-to)3024-3026
Number of pages3
JournalLangmuir
Volume11
Issue number8
DOIs
StatePublished - Aug 1 1995

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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