Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process

Junghun Chae, Xinning Ho, John A. Rogers, Kanti Jain*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

Carbon nanotube films were patterned by an excimer laser projection photoablation process at low incident energy conditions. The carbon nanotubes were deposited on a quartz substrate and then a conventional photoresist was coated on it as a photoablation assistor. The photoresist and the carbon nanotubes were simultaneously patterned by the projection photoablation process, and then the photoresist was removed. It was possible to make clean patterns of carbon nanotubes even though the incident fluence on the carbon nanotubes was significantly lower than the threshold energy otherwise needed for their direct ablation.

Original languageEnglish (US)
Article number173115
JournalApplied Physics Letters
Volume92
Issue number17
DOIs
StatePublished - 2008

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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