Perovskite thin films via atomic layer deposition

Brandon R. Sutherland, Sjoerd Hoogland, Michael M. Adachi, Pongsakorn Kanjanaboos, Chris T.O. Wong, Jeffrey J. McDowell, Jixian Xu, Oleksandr Voznyy, Zhijun Ning, Arjan J. Houtepen, Edward H. Sargent*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

187 Scopus citations

Abstract

(Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.

Original languageEnglish (US)
Pages (from-to)53-58
Number of pages6
JournalAdvanced Materials
Volume27
Issue number1
DOIs
StatePublished - Jan 7 2015

Keywords

  • Atomic layer deposition
  • Optical gain
  • Perovskites
  • Transient absorption

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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