Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers

Tatiana Zubkov, André C.B. Lucassen, Dalia Freeman, Yishay Feldman, Sidney R. Cohen, Guennadi Evmenenko, Pulak Dutta, M. E. Van Der Boom*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations


Trimethoxy-[11-(2-nitrobenzyloxy)undecyl]silane (1) and trimethoxy-[17-(2-nitrobenzyloxy)heptadecyl]silane (2) have been used for the covalent assembly of siloxane-based photopatternable monolayers. Exposing the monolayers to UV light (312 ± 10 nm) results in the generation of reactive hydroxyl-terminated monolayers without affecting the film quality. The new monolayers, deprotection chemistry, and the effect of photoinduced headgroup lift-off on the monolayer microstructure have been studied in detail by a full complement of physicochemical techniques, including optical (UV-vis) spectroscopy, ellipsometry, aqueous contact angle (CA) measurements, X-ray photoelectron spectroscopy (XPS), synchrotron X-ray reflectivity (XRR), and atomic force microscopy (AFM and AFM-force spectroscopy). AFM-force spectroscopy was used to analyze hydrogen-bond interactions as a function of the nature of the solid-liquid interface. AFM-force spectroscopy indicates a hydrogen-bond energy for photodeprotected monolayers of 8.2 kJ mol -1 (∼2 kcal mol -1). Scanning electron microscopy (SEM) revealed that treatment of photopatterned monolayers with ZnEt 2 solutions resulted in well-defined ∼2 μm × 2 μm features of 10 Å thick ZnO layers.

Original languageEnglish (US)
Pages (from-to)14144-14153
Number of pages10
JournalJournal of Physical Chemistry B
Issue number29
StatePublished - Jul 28 2005

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry


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