Photoluminescence from doped silicon nanocrystals in SiO2 matrix

D. Puglia, G. Sombrio, Roberto dos Reis, H. Boudinov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

The influence of doping on the photoluminescence of a system consisting of silicon nanocrystals in silicon dioxide matrix is analyzed. The nanocrystals were grown by annealing of a silicon dioxide deposited with an excess of silicon and then passivated in a Forming Gas atmosphere. The doping of the nanocrystals with boron and arsenic was made by ion implantation. The composition of the samples was determined by Rutherford Backscattering Spectrometry and a structural characterization of the nanocrystals was done by Transmission Electron Microscopy. The influence of different thermal treatments used to grow and to passivate the nanocrystals is compared and a discussion for the possible explanation for the discrepancy in the results is presented. The highest photoluminescence intensity was achieved by arsenic doped silicon nanocrystals.

Original languageEnglish (US)
Title of host publicationChip in Curitiba 2013 - SBMicro 2013
Subtitle of host publication28th Symposium on Microelectronics Technology and Devices
PublisherIEEE Computer Society
ISBN (Print)9781479905188
DOIs
StatePublished - 2013
Event28th Symposium on Microelectronics Technology and Devices, SBMicro 2013 - Curitiba, Brazil
Duration: Sep 2 2013Sep 6 2013

Publication series

NameChip in Curitiba 2013 - SBMicro 2013: 28th Symposium on Microelectronics Technology and Devices

Conference

Conference28th Symposium on Microelectronics Technology and Devices, SBMicro 2013
Country/TerritoryBrazil
CityCuritiba
Period9/2/139/6/13

Keywords

  • doping
  • photoluminescence
  • reactive sputtering
  • silicon nanocrystals

ASJC Scopus subject areas

  • Software
  • Electrical and Electronic Engineering

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