Photon transport and photochemical reaction in laser micro-stereolithography

Xiang Zhang*, Nicholas Fang, Cheng Sun

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The resolution in microstereolithography(μSL) is highly dependent on the photopolymerization process. Using finite volume method to simulate a photon induced polymerization in HDDA with Gaussian illumination on the surface, a numerical model is developed to consider the influence of diffusion dominant effect under high intensity. Simulations were performed to investigate the growth of conversion profile as a consequence of competition between photochemical reaction and mass diffusion. Numerical result reveals some interesting phenomena under illumination of high intensity. A solution of pulsed laser curing is proposed in order to improve the resolution in μSL process.

Original languageEnglish (US)
Title of host publicationProceedings of the International Conference on Energy Conversion and Application (ICECA'2001)
EditorsW. Liu, W. Liu
Pages1146-1150
Number of pages5
StatePublished - Dec 1 2001
EventProceedings of the International Conference on Energy Conversion and Application (ICECA'2001) - Wuhan, China
Duration: Jun 17 2001Jun 20 2001

Publication series

NameProceedings of the International Conference on Energy Conversion and Application (ICECA'2001)

Other

OtherProceedings of the International Conference on Energy Conversion and Application (ICECA'2001)
CountryChina
CityWuhan
Period6/17/016/20/01

Keywords

  • Diffusion
  • Microstereolithography(μSL)
  • Pulsed laser photopolymerization (PLP)

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Photon transport and photochemical reaction in laser micro-stereolithography'. Together they form a unique fingerprint.

Cite this