Photonic systems formed by proximity field nanopatterning

Seokwoo Jeon, Gary Wiederrecht, John A. Rogers*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Abstract

High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.

Original languageEnglish (US)
Article number27
Pages (from-to)187-195
Number of pages9
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume5720
DOIs
StatePublished - Jul 21 2005
EventMicromachining Technology for Micro-Optics and Nano-Optics III - San Jose, CA, United States
Duration: Jan 25 2005Jan 27 2005

Keywords

  • Multi-photon process
  • Phase mask
  • Photonic crystal
  • Proximity field nanopatterning (PnP)

ASJC Scopus subject areas

  • Engineering(all)

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