Abstract
High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.
Original language | English (US) |
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Article number | 27 |
Pages (from-to) | 187-195 |
Number of pages | 9 |
Journal | Progress in Biomedical Optics and Imaging - Proceedings of SPIE |
Volume | 5720 |
DOIs | |
State | Published - Jul 21 2005 |
Event | Micromachining Technology for Micro-Optics and Nano-Optics III - San Jose, CA, United States Duration: Jan 25 2005 → Jan 27 2005 |
Keywords
- Multi-photon process
- Phase mask
- Photonic crystal
- Proximity field nanopatterning (PnP)
ASJC Scopus subject areas
- Engineering(all)