Photonic systems formed by proximity field nanopatterning

Seokwoo Jeon; Gary Wiederrecht; John A. Rogers

doi:10.1117/12.597652

Photonic systems formed by proximity field nanopatterning

Seokwoo Jeon, Gary Wiederrecht, John A. Rogers^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.

Original language	English (US)
Article number	27
Pages (from-to)	187-195
Number of pages	9
Journal	Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume	5720
DOIs	https://doi.org/10.1117/12.597652
State	Published - Jul 21 2005
Event	Micromachining Technology for Micro-Optics and Nano-Optics III - San Jose, CA, United States Duration: Jan 25 2005 → Jan 27 2005

Keywords

Multi-photon process
Phase mask
Photonic crystal
Proximity field nanopatterning (PnP)

ASJC Scopus subject areas

Engineering(all)

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10.1117/12.597652

Cite this

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title = "Photonic systems formed by proximity field nanopatterning",

abstract = "High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.",

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T1 - Photonic systems formed by proximity field nanopatterning

AU - Jeon, Seokwoo

AU - Wiederrecht, Gary

AU - Rogers, John A.

PY - 2005/7/21

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N2 - High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.

AB - High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.

KW - Multi-photon process

KW - Phase mask

KW - Photonic crystal

KW - Proximity field nanopatterning (PnP)

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JO - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

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Photonic systems formed by proximity field nanopatterning

Abstract

Keywords

ASJC Scopus subject areas

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