Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu, Jason R. Babcock, Melissa A. Lane, John A. Belot, Andrew W. Ott, Matthew V. Metz, Carl R. Kannewurf, Robert P.H. Chang, Tobin J. Marks*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations
Original languageEnglish (US)
Pages (from-to)25-28
Number of pages4
JournalChemical Vapor Deposition
Issue number1
StatePublished - Jan 2001

ASJC Scopus subject areas

  • General Chemistry
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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