Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu, Jason R. Babcock, Melissa A. Lane, John A. Belot, Andrew W. Ott, Matthew V. Metz, Carl R. Kannewurf, Robert P.H. Chang, Tobin J. Marks*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Scopus citations
Original languageEnglish (US)
Pages (from-to)25-28
Number of pages4
JournalChemical Vapor Deposition
Volume7
Issue number1
DOIs
StatePublished - Jan 1 2001

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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