Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu; Jason R. Babcock; Melissa A. Lane; John A. Belot; Andrew W. Ott; Matthew V. Metz; Carl R. Kannewurf; Robert P.H. Chang; Tobin J. Marks

doi:10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu, Jason R. Babcock, Melissa A. Lane, John A. Belot, Andrew W. Ott, Matthew V. Metz, Carl R. Kannewurf, Robert P.H. Chang, Tobin J. Marks^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Original language	English (US)
Pages (from-to)	25-28
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	7
Issue number	1
DOIs	https://doi.org/10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O
State	Published - Jan 1 2001

ASJC Scopus subject areas

Chemistry(all)
Surfaces and Interfaces
Process Chemistry and Technology

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10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

Cite this

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title = "Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors",

author = "Xiang Liu and Babcock, {Jason R.} and Lane, {Melissa A.} and Belot, {John A.} and Ott, {Andrew W.} and Metz, {Matthew V.} and Kannewurf, {Carl R.} and Chang, {Robert P.H.} and Marks, {Tobin J.}",

year = "2001",

month = jan,

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doi = "10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O",

language = "English (US)",

volume = "7",

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journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

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TY - JOUR

T1 - Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

AU - Liu, Xiang

AU - Babcock, Jason R.

AU - Lane, Melissa A.

AU - Belot, John A.

AU - Ott, Andrew W.

AU - Metz, Matthew V.

AU - Kannewurf, Carl R.

AU - Chang, Robert P.H.

AU - Marks, Tobin J.

PY - 2001/1/1

Y1 - 2001/1/1

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U2 - 10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

DO - 10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

M3 - Article

AN - SCOPUS:0039145629

SN - 0948-1907

VL - 7

SP - 25

EP - 28

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 1

ER -

Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

ASJC Scopus subject areas

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CCDC 142492: Experimental Crystal Structure Determination

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Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

ASJC Scopus subject areas

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Datasets

CCDC 142492: Experimental Crystal Structure Determination

Cite this