Plasmonic nanolithography

Werayut Srituravanich, Nicholas Fang, Cheng Sun, Qi Luo, Xiang Zhang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

527 Scopus citations

Abstract

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

Original languageEnglish (US)
Pages (from-to)1085-1088
Number of pages4
JournalNano Letters
Volume4
Issue number6
DOIs
StatePublished - Jun 1 2004

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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