Plasmonic nanolithography

Werayut Srituravanich; Nicholas Fang; Cheng Sun; Qi Luo; Xiang Zhang

doi:10.1021/nl049573q

Plasmonic nanolithography

Werayut Srituravanich, Nicholas Fang, Cheng Sun, Qi Luo, Xiang Zhang^*

^*Corresponding author for this work

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

527 Scopus citations

Abstract

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

Original language	English (US)
Pages (from-to)	1085-1088
Number of pages	4
Journal	Nano Letters
Volume	4
Issue number	6
DOIs	https://doi.org/10.1021/nl049573q
State	Published - Jun 1 2004

ASJC Scopus subject areas

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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author = "Werayut Srituravanich and Nicholas Fang and Cheng Sun and Qi Luo and Xiang Zhang",

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AU - Srituravanich, Werayut

AU - Fang, Nicholas

AU - Sun, Cheng

AU - Luo, Qi

AU - Zhang, Xiang

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AB - In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

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JO - Nano Letters

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SN - 1530-6984

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Plasmonic nanolithography

Abstract

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