Plasmonic nanolithography

Werayut Srituravanich; Nicholas Fang; Cheng Sun; Qi Luo; Xiang Zhang

doi:10.1021/nl049573q

Plasmonic nanolithography

Werayut Srituravanich, Nicholas Fang, Cheng Sun, Qi Luo, Xiang Zhang^*

^*Corresponding author for this work

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

576 Scopus citations

Abstract

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

Original language	English (US)
Pages (from-to)	1085-1088
Number of pages	4
Journal	Nano letters
Volume	4
Issue number	6
DOIs	https://doi.org/10.1021/nl049573q
State	Published - Jun 2004

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

Access to Document

10.1021/nl049573q

Cite this

@article{373dfbe9dedf458990383ded4ac17694,

title = "Plasmonic nanolithography",

abstract = "In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.",

author = "Werayut Srituravanich and Nicholas Fang and Cheng Sun and Qi Luo and Xiang Zhang",

year = "2004",

month = jun,

doi = "10.1021/nl049573q",

language = "English (US)",

volume = "4",

pages = "1085--1088",

journal = "Nano letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "6",

}

TY - JOUR

T1 - Plasmonic nanolithography

AU - Srituravanich, Werayut

AU - Fang, Nicholas

AU - Sun, Cheng

AU - Luo, Qi

AU - Zhang, Xiang

PY - 2004/6

Y1 - 2004/6

N2 - In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

AB - In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

UR - http://www.scopus.com/inward/record.url?scp=3042799702&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3042799702&partnerID=8YFLogxK

U2 - 10.1021/nl049573q

DO - 10.1021/nl049573q

M3 - Article

AN - SCOPUS:3042799702

SN - 1530-6984

VL - 4

SP - 1085

EP - 1088

JO - Nano letters

JF - Nano letters

IS - 6

ER -

Plasmonic nanolithography

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this