Abstract
In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.
Original language | English (US) |
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Pages (from-to) | 1085-1088 |
Number of pages | 4 |
Journal | Nano letters |
Volume | 4 |
Issue number | 6 |
DOIs | |
State | Published - Jun 2004 |
ASJC Scopus subject areas
- Bioengineering
- General Chemistry
- General Materials Science
- Condensed Matter Physics
- Mechanical Engineering