Abstract
Nearfield scanning optical microscopy (NSOM) offers a practical means of optical imaging, optical sensing, and nanolithography at a resolution below the diffraction limit of the light. However, its applications are limited due to the strong attenuation of the light transmitted through the subwavelength aperture. To solve this problem, we report the development of plasmonic nearfield scanning optical microscope with an efficient nearfield focusing. By exciting surface plasmons, plasmonic NSOM probes are capable of confining light into a 100 nm spot. We show by nearfield lithography experiments that the intensity at the near field is at least one order stronger than the intensity obtained from the conventional NSOM probes under the same illumination condition. Such a high efficiency can enable plasmonic NSOM as a practical tool for nearfield lithography, data storage, cellular visualization, and many other applications requiring efficient transmission with high resolution.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 3041-3045 |
| Number of pages | 5 |
| Journal | Nano letters |
| Volume | 8 |
| Issue number | 9 |
| DOIs | |
| State | Published - Sep 2008 |
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Materials Science(all)
- Condensed Matter Physics
- Mechanical Engineering