The synthesis, characterization, and solid-state structure of a superior new monomeric Mg metal-organic chemical vapor deposition (MOCVD) precursor, Mg(dpm)2TMEDA is reported. The complex is prepared using commercially available reagents via a simple aqueous route under ambient laboratory conditions. Clean and complete volatilization with no loss of coordinated ligands is observed by thermogravimetric analysis (TGA) at a lower temperature than the commonly used Mg precursor, [Mg(dpm)2]2. High-quality epitaxial films of (100) and (110) MgO are grown using MOCVD on (100) and (110) SrTiO3 using this precursor.
|Original language||English (US)|
|Number of pages||4|
|State||Published - Aug 1 2000|
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering