Polyethylene glycol as a novel resist and sacrificial material for generating positive and negative nanostructures

Raymond G. Sanedrin, Ling Huang, Jae Won Jang, Joseph Kakkassery, Chad A Mirkin

Research output: Contribution to journalArticle

14 Scopus citations

Abstract

Polyethylene glycol has proved to be a novel resist and sacrificial material for generating positive and negative nanostructures using dip-pen nanolithography (DPN). DPN templates of the PEG features were used as a protective layer to generate raised or recessed structures on surfaces and in the experiment a cantilever array with 26 tips was dipped into a 5 mg mL -1 acetonitrile solution of PEG for 10 seconds and then mounted on an NSCRIPTOR and used to generate dots and lines on gold surfaces. A 26-pen parallel array was used to generate 26 15 × 20 PEG dot arrays on a gold thin-film substrate. The PEG resist when coupled with wet chemical etching, allows to generate solid-state nanostructures and as a result, positive solid-state nanostructures were generated on direct incubation of the PEG-patterned substrate in the same aqueous etching solution.

Original languageEnglish (US)
Pages (from-to)920-924
Number of pages5
JournalSmall
Volume4
Issue number7
DOIs
StatePublished - Jul 1 2008

Keywords

  • Dip-pen nanolithography
  • Nanostructures
  • Polyethylene glycol
  • Resists
  • Wet chemical etching

ASJC Scopus subject areas

  • Biomaterials
  • Engineering (miscellaneous)
  • Biotechnology
  • Medicine(all)

Fingerprint Dive into the research topics of 'Polyethylene glycol as a novel resist and sacrificial material for generating positive and negative nanostructures'. Together they form a unique fingerprint.

Cite this