Preparation and Properties of Nb/Al-AlOx/Nb Multilayers

H. Kohlstedt, G. Hallmanns, I. P. Nevirkovets, D. Guggi, C. Heiden

Research output: Contribution to journalLetter

36 Scopus citations

Abstract

We have deposited Nb/Al-A10x/Nb multilayers on Si substrates by DC and RF magnetron sputtering. To assist the fabrication of stacked tunnel junctions we investigated the layers by transmission electron microscopy and anodization spectroscopy. The accumulated internal mechanical stress in the niobium films depends on the argon sputtering pressure and was analyzed by the X-ray stress evaluation method. Up to ten junctions in one stack were prepared. Performance of the junctions is discussed on basis of I-V characteristics and Fraunhofer patterns.

Original languageEnglish (US)
Pages (from-to)2197-2200
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Volume3
Issue number1
DOIs
StatePublished - Mar 1993
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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