@inproceedings{5792599ad3d04d0eb3e7b99ef57fefde,
title = "PRIMARY AND SECONDARY ION DEPOSITION OF EPITAXIAL SEMICONDUCTOR FILMS FROM LASER-INDUCED PLASMAS.",
abstract = "Primary and secondary ion deposition of epitaxial semiconductor films from laser-induced plasmas is reported. Primary ion deposition was performed by placing substrates on an ion target/substrate heater biased to give additional ion acceleration as required. Secondary deposition was achieved by biasing the ion target, in this case a wafer of the same material as the laser target, sufficiently negative to sputter target material onto a third electrode.",
author = "D. Lubben and Barnett, {S. A.} and K. Suzuki and Greene, {J. E.}",
year = "1984",
month = dec,
day = "1",
language = "English (US)",
isbn = "0444008942",
series = "Materials Research Society Symposia Proceedings",
publisher = "North-Holland",
pages = "359--365",
editor = "A.Wayne Johnson and Ehrlich, {Daniel J.} and Schlossberg, {Howard R.}",
booktitle = "Materials Research Society Symposia Proceedings",
}