Process for the Formation of Highly Uniform Arrays of Nano-holes and Nano-pillars

Hooman Mohseni (Inventor)

Research output: Patent

Abstract

"Maskless" Nano-Patterning Northwestern researchers have invented a low-cost, "maskless" photolithography method to produce highly uniform arrays of nanopillars and nanoholes over a large area. Abstract The invention uses a self-assembled, ordered monolayer of hexagonally close packed (HCP) micro-spheres as optical lenses to generate deep sub-wavelength regular patterns over a large area on standard photoresist. It has been demonstrated that hole size is relatively independent of microsphere diameter, and so hole diameter is highly uniform even as microspheres vary in size. Microspheres are not formed directly on the substrate surface, which enables the use of any material compatible with a standard photoresist process.
Original languageEnglish
Patent number8445188
StatePublished - Apr 1 2010

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