Process modeling of projection micro stereo lithography for three-dimensional MEMS

Cheng Sun; Nicholas Fang; Xiang Zhang

Process modeling of projection micro stereo lithography for three-dimensional MEMS

Cheng Sun^*, Nicholas Fang, Xiang Zhang

^*Corresponding author for this work

Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

6 Scopus citations

Abstract

We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstructures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported.

Original language	English (US)
Title of host publication	Micro-Electro-Mechanical Systems (MEMS) - 2001
Editors	A.L. Lee, J. Simon, K. Breuer, S. Chen, R.S. Keynton, A. Malshe, J.-I. Mou, M. Dunn
Pages	813-818
Number of pages	6
State	Published - 2001
Event	2001 ASME International Mechanical Engineering Congress and Exposition - New York, NY, United States Duration: Nov 11 2001 → Nov 16 2001

Publication series

Name	American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)
Volume	3

Other

Other	2001 ASME International Mechanical Engineering Congress and Exposition
Country/Territory	United States
City	New York, NY
Period	11/11/01 → 11/16/01

ASJC Scopus subject areas

General Engineering

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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Sun, C., Fang, N., & Zhang, X. (2001). Process modeling of projection micro stereo lithography for three-dimensional MEMS. In A. L. Lee, J. Simon, K. Breuer, S. Chen, R. S. Keynton, A. Malshe, J.-I. Mou, & M. Dunn (Eds.), Micro-Electro-Mechanical Systems (MEMS) - 2001 (pp. 813-818). (American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS); Vol. 3).

Sun, Cheng ; Fang, Nicholas ; Zhang, Xiang. / Process modeling of projection micro stereo lithography for three-dimensional MEMS. Micro-Electro-Mechanical Systems (MEMS) - 2001. editor / A.L. Lee ; J. Simon ; K. Breuer ; S. Chen ; R.S. Keynton ; A. Malshe ; J.-I. Mou ; M. Dunn. 2001. pp. 813-818 (American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)).

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title = "Process modeling of projection micro stereo lithography for three-dimensional MEMS",

abstract = "We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstructures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported.",

author = "Cheng Sun and Nicholas Fang and Xiang Zhang",

year = "2001",

language = "English (US)",

isbn = "0791835553",

series = "American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)",

pages = "813--818",

editor = "A.L. Lee and J. Simon and K. Breuer and S. Chen and R.S. Keynton and A. Malshe and J.-I. Mou and M. Dunn",

booktitle = "Micro-Electro-Mechanical Systems (MEMS) - 2001",

note = "2001 ASME International Mechanical Engineering Congress and Exposition ; Conference date: 11-11-2001 Through 16-11-2001",

}

Sun, C, Fang, N & Zhang, X 2001, Process modeling of projection micro stereo lithography for three-dimensional MEMS. in AL Lee, J Simon, K Breuer, S Chen, RS Keynton, A Malshe, J-I Mou & M Dunn (eds), Micro-Electro-Mechanical Systems (MEMS) - 2001. American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS), vol. 3, pp. 813-818, 2001 ASME International Mechanical Engineering Congress and Exposition, New York, NY, United States, 11/11/01.

Process modeling of projection micro stereo lithography for three-dimensional MEMS. / Sun, Cheng; Fang, Nicholas; Zhang, Xiang.
Micro-Electro-Mechanical Systems (MEMS) - 2001. ed. / A.L. Lee; J. Simon; K. Breuer; S. Chen; R.S. Keynton; A. Malshe; J.-I. Mou; M. Dunn. 2001. p. 813-818 (American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS); Vol. 3).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Fang, Nicholas

AU - Zhang, Xiang

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N2 - We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstructures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported.

AB - We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstructures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported.

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M3 - Conference contribution

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SN - 0791835553

T3 - American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)

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EP - 818

BT - Micro-Electro-Mechanical Systems (MEMS) - 2001

A2 - Lee, A.L.

A2 - Simon, J.

A2 - Breuer, K.

A2 - Chen, S.

A2 - Keynton, R.S.

A2 - Malshe, A.

A2 - Mou, J.-I.

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T2 - 2001 ASME International Mechanical Engineering Congress and Exposition

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Process modeling of projection micro stereo lithography for three-dimensional MEMS

Abstract

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ASJC Scopus subject areas

UN SDGs

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