TY - GEN
T1 - Process modeling of projection micro stereo lithography for three-dimensional MEMS
AU - Sun, Cheng
AU - Fang, Nicholas
AU - Zhang, Xiang
PY - 2001/12/1
Y1 - 2001/12/1
N2 - We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstructures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported.
AB - We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstructures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported.
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M3 - Conference contribution
AN - SCOPUS:1542747759
SN - 0791835553
T3 - American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)
SP - 813
EP - 818
BT - Micro-Electro-Mechanical Systems (MEMS) - 2001
A2 - Lee, A.L.
A2 - Simon, J.
A2 - Breuer, K.
A2 - Chen, S.
A2 - Keynton, R.S.
A2 - Malshe, A.
A2 - Mou, J.-I.
A2 - Dunn, M.
T2 - 2001 ASME International Mechanical Engineering Congress and Exposition
Y2 - 11 November 2001 through 16 November 2001
ER -