Projection micro-stereolithography using digital micro-mirror dynamic mask

C. Sun, N. Fang, D. M. Wu, X. Zhang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

510 Scopus citations

Abstract

We present in this paper the development of a high-resolution projection micro-stereolithography (PμSL) process by using the Digital Micromirror Device (DMD™, Texas Instruments) as a dynamic mask. This unique technology provides a parallel fabrication of complex three-dimensional (3D) microstructures used for micro electro-mechanical systems (MEMS). Based on the understanding of underlying mechanisms, a process model has been developed with all critical parameters obtained from the experimental measurement. By coupling the experimental measurement and the process model, the photon-induced curing behavior of the resin has been quantitatively studied. The role of UV doping has been thereafter justified, as it can effectively reduce the curing depth without compromising the chemical property of the resin. The fabrication of complex 3D microstructures, such as matrix, and micro-spring array, with the smallest feature of 0.6 μm, has been demonstrated.

Original languageEnglish (US)
Pages (from-to)113-120
Number of pages8
JournalSensors and Actuators, A: Physical
Volume121
Issue number1
DOIs
StatePublished - May 31 2005

Keywords

  • Dynamic mask
  • Polymer
  • Projection micro-stereolithography
  • Three-dimensional microfabrication

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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