Proximity effect coupled V Cr superlattices

B. M. Davis*, J. Q. Zheng, P. R. Auvil, J. B. Ketterson, J. E. Hilliard

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

VmCrn superlattices, where m and n denote the number of atomic planes of V and Cr in each layer, with m equal to 98, 147, 175 and 197 and n varying between 3 and 100 have been prepared. The films were grown in an ultra-high vacuum chamber (base pressure ≈1×10-9 Torr) equipped with dual e-guns and a rotating substrate holder. Films were grown at 250°C on "c" cut sapphire substrates. The zero field transition temperature and parallel upper critical field of the films have been measured. A dimensional crossover in the parallel upper critical field is observed at n equal to about 80. The zero field transition temperature data has been modeled using the procedures and of Werthamer and Auvil and Ketterson. The magnetic scattering time, τ, in the Cr layers has been found to be dependent on the vacuum during deposition: 4.5×10-14 sec for films deposited at ≤ 4×10-7 Torr and 5.5×10-14 sec for films deposited at ≤ 4×10-8 Torr. For the V175Crx series with n >- 80 the best fits occur for infinite scattering time τ.

Original languageEnglish (US)
Pages (from-to)465-471
Number of pages7
JournalSuperlattices and Microstructures
Volume4
Issue number4-5
DOIs
StatePublished - 1988

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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