Pulsed excimer laser deposition of potassium titanyl phosphate films

Fulin Xiong*, R P H Chang, M. E. Hagerman, V. L. Kozhevnikov, Kenneth Poeppelmeier, Haitain Zhou, G. K. Wong, John B Ketterson, C. W. White

*Corresponding author for this work

Research output: Contribution to journalArticle

14 Scopus citations

Abstract

Nonlinear optical thin films of potassium titanyl phosphate (KTP) have been successfully fabricated by pulsed excimer laser deposition on substrates of sapphire and Si. The films deposited on sapphire substrates in the temperature ranges of 450-550°C show good crystallinity with preferential (100) and (011) orientations; on silicon, the films are polycrystalline. The stoichiometry of the films has been found to be Ti rich (about 20% higher). The effective refractive index of the films has been evaluated by spectroscopic ellipsometry with values between 1.75 and 2.0 in the spectral region 0.3-0.9 μm, consistent with the bulk value. The deposited films show a promising nonlinear optical response with high second-harmonic generation efficiency, comparable to that of single-crystal KTP.

Original languageEnglish (US)
Pages (from-to)161-163
Number of pages3
JournalApplied Physics Letters
Volume64
Issue number2
DOIs
StatePublished - Dec 1 1994

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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