Pulsed laser deposition of Cu:Al2O3 nanocrystal thin films with high third-order optical susceptibility

J. M. Ballesteros; R. Serna; J. Solís; C. N. Afonso; A. K. Petford-Long; D. H. Osborne; R. F. Haglund

doi:10.1063/1.120117

Pulsed laser deposition of Cu:Al₂O₃ nanocrystal thin films with high third-order optical susceptibility

J. M. Ballesteros^*, R. Serna, J. Solís, C. N. Afonso, A. K. Petford-Long, D. H. Osborne, R. F. Haglund

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

129 Scopus citations

Abstract

Nanocomposite films comprising metal Cu nanocrystals embedded in an Al₂O₃ matrix were deposited by alternating pulsed laser ablation from metallic Cu and ceramic Al₂O₃ targets. The films were grown in vacuum on glass substrates held at room temperature. The as-grown films contain 4 nm Cu nanocrystals in an amorphous Al₂O₃ matrix, with a total thickness of 190 nm. The films show a substantial third-order susceptibility with an electronic nonlinear refractive index of (2.93 ± 1.08) · 10^-10 cm² W^-1 and a nonlinear saturation of -(2.34±0.18) · 10^-5 cm W^-1.

Original language	English (US)
Pages (from-to)	2445-2447
Number of pages	3
Journal	Applied Physics Letters
Volume	71
Issue number	17
DOIs	https://doi.org/10.1063/1.120117
State	Published - Oct 27 1997

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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@article{21f3af1b4a744e349c4f8297e04edb0e,

title = "Pulsed laser deposition of Cu:Al2O3 nanocrystal thin films with high third-order optical susceptibility",

abstract = "Nanocomposite films comprising metal Cu nanocrystals embedded in an Al2O3 matrix were deposited by alternating pulsed laser ablation from metallic Cu and ceramic Al2O3 targets. The films were grown in vacuum on glass substrates held at room temperature. The as-grown films contain 4 nm Cu nanocrystals in an amorphous Al2O3 matrix, with a total thickness of 190 nm. The films show a substantial third-order susceptibility with an electronic nonlinear refractive index of (2.93 ± 1.08) · 10-10 cm2 W-1 and a nonlinear saturation of -(2.34±0.18) · 10-5 cm W-1.",

author = "Ballesteros, {J. M.} and R. Serna and J. Sol{\'i}s and Afonso, {C. N.} and Petford-Long, {A. K.} and Osborne, {D. H.} and Haglund, {R. F.}",

year = "1997",

month = oct,

day = "27",

doi = "10.1063/1.120117",

language = "English (US)",

volume = "71",

pages = "2445--2447",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "17",

}

TY - JOUR

T1 - Pulsed laser deposition of Cu:Al2O3 nanocrystal thin films with high third-order optical susceptibility

AU - Ballesteros, J. M.

AU - Serna, R.

AU - Solís, J.

AU - Afonso, C. N.

AU - Petford-Long, A. K.

AU - Osborne, D. H.

AU - Haglund, R. F.

PY - 1997/10/27

Y1 - 1997/10/27

N2 - Nanocomposite films comprising metal Cu nanocrystals embedded in an Al2O3 matrix were deposited by alternating pulsed laser ablation from metallic Cu and ceramic Al2O3 targets. The films were grown in vacuum on glass substrates held at room temperature. The as-grown films contain 4 nm Cu nanocrystals in an amorphous Al2O3 matrix, with a total thickness of 190 nm. The films show a substantial third-order susceptibility with an electronic nonlinear refractive index of (2.93 ± 1.08) · 10-10 cm2 W-1 and a nonlinear saturation of -(2.34±0.18) · 10-5 cm W-1.

AB - Nanocomposite films comprising metal Cu nanocrystals embedded in an Al2O3 matrix were deposited by alternating pulsed laser ablation from metallic Cu and ceramic Al2O3 targets. The films were grown in vacuum on glass substrates held at room temperature. The as-grown films contain 4 nm Cu nanocrystals in an amorphous Al2O3 matrix, with a total thickness of 190 nm. The films show a substantial third-order susceptibility with an electronic nonlinear refractive index of (2.93 ± 1.08) · 10-10 cm2 W-1 and a nonlinear saturation of -(2.34±0.18) · 10-5 cm W-1.

UR - http://www.scopus.com/inward/record.url?scp=0001651332&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001651332&partnerID=8YFLogxK

U2 - 10.1063/1.120117

DO - 10.1063/1.120117

M3 - Article

AN - SCOPUS:0001651332

SN - 0003-6951

VL - 71

SP - 2445

EP - 2447

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 17

ER -

Pulsed laser deposition of Cu:Al₂O₃ nanocrystal thin films with high third-order optical susceptibility

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