Pulsed laser-induced electron and positive-ion emission from Cu(100) under ultrahigh-vacuum conditions near the threshold for surface damage

Keyphrases

• Ultra-high Vacuum 100%
• Laser-induced 100%
• Pulsed Laser 100%
• Vacuum Condition 100%
• Surface Damage 100%
• Cu(111) 100%
• Positive Ions 100%
• Ion Emission 100%
• Laser Pulse 66%
• Order of Magnitude 33%
• Annealing 33%
• Low Power 33%
• Surface Plasma 33%
• Increased Yield 33%
• Surface Defects 33%
• Charged Particles 33%
• Photoemission 33%
• Desorbed 33%
• Laser Irradiation 33%
• Laser Spot 33%
• Electron Emission 33%
• Subsequent Annealing 33%
• Ion Yield 33%
• Three-photon 33%
• Electron Yield 33%
• Particle Yield 33%
• Thermionic Electron Emission 33%
• Kinetic Energy Distribution 33%
• Single Crystal Cu 33%
• Ion Production 33%
• Power Threshold 33%

Physics

• Pulsed Laser 100%
• Positive Ion 100%
• Ultrahigh Vacuum 100%
• Ion Emission 100%
• Laser Pulse 66%
• Electron Emission 66%
• Charged Particle 33%
• Thermionics 33%
• Surface Defect 33%
• Kinetic Energy 33%
• Single Crystal 33%
• Photoelectric Emission 33%
• Energy Distribution 33%
• Blood Plasma 33%