Quantifying distortions in soft lithography

John A. Rogers, Kateri E. Paul, George M. Whitesides*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

128 Scopus citations

Abstract

This article describes a moiré technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1 μm over areas ∼1 cm2. We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.

Original languageEnglish (US)
Pages (from-to)88-97
Number of pages10
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number1
DOIs
StatePublished - 1998

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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