Quantifying distortions in soft lithography

John A. Rogers; Kateri E. Paul; George M. Whitesides

doi:10.1116/1.589841

Quantifying distortions in soft lithography

John A. Rogers, Kateri E. Paul, George M. Whitesides^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

128 Scopus citations

Abstract

This article describes a moiré technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1 μm over areas ∼1 cm². We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.

Original language	English (US)
Pages (from-to)	88-97
Number of pages	10
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	16
Issue number	1
DOIs	https://doi.org/10.1116/1.589841
State	Published - 1998

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1116/1.589841

Cite this

@article{400be0a18f0e4e439b8e4dc68b267fa2,

title = "Quantifying distortions in soft lithography",

abstract = "This article describes a moir{\'e} technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1 μm over areas ∼1 cm2. We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.",

author = "Rogers, {John A.} and Paul, {Kateri E.} and Whitesides, {George M.}",

year = "1998",

doi = "10.1116/1.589841",

language = "English (US)",

volume = "16",

pages = "88--97",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

number = "1",

}

TY - JOUR

T1 - Quantifying distortions in soft lithography

AU - Rogers, John A.

AU - Paul, Kateri E.

AU - Whitesides, George M.

PY - 1998

Y1 - 1998

N2 - This article describes a moiré technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1 μm over areas ∼1 cm2. We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.

AB - This article describes a moiré technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1 μm over areas ∼1 cm2. We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.

UR - http://www.scopus.com/inward/record.url?scp=0031683340&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031683340&partnerID=8YFLogxK

U2 - 10.1116/1.589841

DO - 10.1116/1.589841

M3 - Article

AN - SCOPUS:0031683340

SN - 1071-1023

VL - 16

SP - 88

EP - 97

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 1

ER -

Quantifying distortions in soft lithography

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this