TY - JOUR
T1 - Range profiles of 300- and 475-eV He+4 ions and the diffusivity of He4 in tungsten
AU - Wagner, Alfred
AU - Seidman, David N.
PY - 1979
Y1 - 1979
N2 - Range profiles for 300- and 475-eV He+4 ions implanted in situ in tungsten at 60, 61, 80, 90 K were measured, directly and absolutely, employing an atom-probe field-ion microscope. A mean range (x̄) of 40 ± 4 and a parent standard deviation (σ) of 20 to 36 was obtained for 300-eV He+4; values of x̄ and σ of 56 ± 6 and 37 to 42 , respectively, were determined for 475-eV He+4. The existence of an isolated and immobile interstitial He4 atom was established and an enthalpy change of migration of 0.24 and 0.32 eV was determined.
AB - Range profiles for 300- and 475-eV He+4 ions implanted in situ in tungsten at 60, 61, 80, 90 K were measured, directly and absolutely, employing an atom-probe field-ion microscope. A mean range (x̄) of 40 ± 4 and a parent standard deviation (σ) of 20 to 36 was obtained for 300-eV He+4; values of x̄ and σ of 56 ± 6 and 37 to 42 , respectively, were determined for 475-eV He+4. The existence of an isolated and immobile interstitial He4 atom was established and an enthalpy change of migration of 0.24 and 0.32 eV was determined.
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U2 - 10.1103/PhysRevLett.42.515
DO - 10.1103/PhysRevLett.42.515
M3 - Article
AN - SCOPUS:25944458805
SN - 0031-9007
VL - 42
SP - 515
EP - 518
JO - Physical review letters
JF - Physical review letters
IS - 8
ER -