Range profiles of 300- and 475-eV He+4 ions and the diffusivity of He4 in tungsten

Alfred Wagner*, David N. Seidman

*Corresponding author for this work

Research output: Contribution to journalArticle

70 Scopus citations

Abstract

Range profiles for 300- and 475-eV He+4 ions implanted in situ in tungsten at 60, 61, 80, 90 K were measured, directly and absolutely, employing an atom-probe field-ion microscope. A mean range (x̄) of 40 ± 4 and a parent standard deviation (σ) of 20 to 36 was obtained for 300-eV He+4; values of x̄ and σ of 56 ± 6 and 37 to 42 , respectively, were determined for 475-eV He+4. The existence of an isolated and immobile interstitial He4 atom was established and an enthalpy change of migration of 0.24 and 0.32 eV was determined.

Original languageEnglish (US)
Pages (from-to)515-518
Number of pages4
JournalPhysical Review Letters
Volume42
Issue number8
DOIs
StatePublished - Jan 1 1979

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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