Reactive ion etching of InP and its optical assessment

R. W. MacLeod*, C. M Sotomayor Torres, M. Razeghi, C. R. Stanley, C. D W Wilkinson

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish (US)
Pages (from-to)562-567
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
Issue numberpt 1
StatePublished - 1991
EventPhysical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization - Aachen, Ger
Duration: Oct 28 1990Nov 2 1990

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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