Reactive sputtering of high moment Fe-N soft magnetic films with in-situ plasma diagnosis and control

G. Pan; L. Wang; R. Buckley; K. Kang; A. Petford-Long

doi:10.1109/20.951149

Reactive sputtering of high moment Fe-N soft magnetic films with in-situ plasma diagnosis and control

G. Pan^*, L. Wang, R. Buckley, K. Kang, A. Petford-Long

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

Fe-N films with 4πM_s of up to 26 kG were deposited by reactive rf-sputtering on single crystal Si(001) and glass substrates with Fe seed layers. Optical emission spectra of the Ar/N₂ plasma were obtained from the vicinity of the target surface via an optical fiber. Nitrogen content of the plasma was pre-set according to the peak height (set point) of a particular wavelength emission peak of the optical emission spectrum of the plasma and maintained constant throughout the film deposition process via the closed loop controller. The saturation magnetization of the Fe-N films initially increased with the increase of N content in the plasma (set point), reaching maximum at set point around 40 and then decreased with further increase of nitrogen. The nitrogen content of the films with maximum 4πM_s was about 4.26 at%. The major phase of the as-deposited Fe-N films, analyzed by X-ray diffraction was α-Fe. Minor diffraction peaks at 2θ of 28.9° corresponding to α″-Fe₁₆N₂ phase were present for Fe-N films, which might be responsible for the increase of saturation magnetization of the Fe-N films.

Original language	English (US)
Pages (from-to)	2284-2287
Number of pages	4
Journal	IEEE Transactions on Magnetics
Volume	37
Issue number	4 I
DOIs	https://doi.org/10.1109/20.951149
State	Published - Jul 2001
Event	8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States Duration: Jan 7 2001 → Jan 11 2001

Funding

Manuscript received October 13, 2000. This work was supported by the UK EPSRC under Grant GR/M46808. G. Pan and L. Wang are with CRIST, Department of Communication and Electronic Engineering, University of Plymouth, Plymouth, Devon, PL4 8AA, UK (e-mail: [email protected]). R. Buckley is with the Department of Engineering Materials, University of Sheffield, Sheffield, S1 3JD, UK. K. Kang and A. Petford-Long are with the Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH, UK. Publisher Item Identifier S 0018-9464(01)06763-2.

Keywords

Fe-N films
Reactive sputtering
Saturation magnetization
Soft magnetic properties

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/20.951149

Cite this

@article{8a539b5ea196492f894f22adabe1a395,

title = "Reactive sputtering of high moment Fe-N soft magnetic films with in-situ plasma diagnosis and control",

abstract = "Fe-N films with 4πMs of up to 26 kG were deposited by reactive rf-sputtering on single crystal Si(001) and glass substrates with Fe seed layers. Optical emission spectra of the Ar/N2 plasma were obtained from the vicinity of the target surface via an optical fiber. Nitrogen content of the plasma was pre-set according to the peak height (set point) of a particular wavelength emission peak of the optical emission spectrum of the plasma and maintained constant throughout the film deposition process via the closed loop controller. The saturation magnetization of the Fe-N films initially increased with the increase of N content in the plasma (set point), reaching maximum at set point around 40 and then decreased with further increase of nitrogen. The nitrogen content of the films with maximum 4πMs was about 4.26 at%. The major phase of the as-deposited Fe-N films, analyzed by X-ray diffraction was α-Fe. Minor diffraction peaks at 2θ of 28.9° corresponding to α″-Fe16N2 phase were present for Fe-N films, which might be responsible for the increase of saturation magnetization of the Fe-N films.",

keywords = "Fe-N films, Reactive sputtering, Saturation magnetization, Soft magnetic properties",

author = "G. Pan and L. Wang and R. Buckley and K. Kang and A. Petford-Long",

note = "Funding Information: Manuscript received October 13, 2000. This work was supported by the UK EPSRC under Grant GR/M46808. G. Pan and L. Wang are with CRIST, Department of Communication and Electronic Engineering, University of Plymouth, Plymouth, Devon, PL4 8AA, UK (e-mail: [email protected]). R. Buckley is with the Department of Engineering Materials, University of Sheffield, Sheffield, S1 3JD, UK. K. Kang and A. Petford-Long are with the Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH, UK. Publisher Item Identifier S 0018-9464(01)06763-2.; 8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) ; Conference date: 07-01-2001 Through 11-01-2001",

year = "2001",

month = jul,

doi = "10.1109/20.951149",

language = "English (US)",

volume = "37",

pages = "2284--2287",

journal = "IEEE Transactions on Magnetics",

issn = "0018-9464",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "4 I",

}

TY - JOUR

T1 - Reactive sputtering of high moment Fe-N soft magnetic films with in-situ plasma diagnosis and control

AU - Pan, G.

AU - Wang, L.

AU - Buckley, R.

AU - Kang, K.

AU - Petford-Long, A.

N1 - Funding Information: Manuscript received October 13, 2000. This work was supported by the UK EPSRC under Grant GR/M46808. G. Pan and L. Wang are with CRIST, Department of Communication and Electronic Engineering, University of Plymouth, Plymouth, Devon, PL4 8AA, UK (e-mail: [email protected]). R. Buckley is with the Department of Engineering Materials, University of Sheffield, Sheffield, S1 3JD, UK. K. Kang and A. Petford-Long are with the Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH, UK. Publisher Item Identifier S 0018-9464(01)06763-2.

PY - 2001/7

Y1 - 2001/7

N2 - Fe-N films with 4πMs of up to 26 kG were deposited by reactive rf-sputtering on single crystal Si(001) and glass substrates with Fe seed layers. Optical emission spectra of the Ar/N2 plasma were obtained from the vicinity of the target surface via an optical fiber. Nitrogen content of the plasma was pre-set according to the peak height (set point) of a particular wavelength emission peak of the optical emission spectrum of the plasma and maintained constant throughout the film deposition process via the closed loop controller. The saturation magnetization of the Fe-N films initially increased with the increase of N content in the plasma (set point), reaching maximum at set point around 40 and then decreased with further increase of nitrogen. The nitrogen content of the films with maximum 4πMs was about 4.26 at%. The major phase of the as-deposited Fe-N films, analyzed by X-ray diffraction was α-Fe. Minor diffraction peaks at 2θ of 28.9° corresponding to α″-Fe16N2 phase were present for Fe-N films, which might be responsible for the increase of saturation magnetization of the Fe-N films.

AB - Fe-N films with 4πMs of up to 26 kG were deposited by reactive rf-sputtering on single crystal Si(001) and glass substrates with Fe seed layers. Optical emission spectra of the Ar/N2 plasma were obtained from the vicinity of the target surface via an optical fiber. Nitrogen content of the plasma was pre-set according to the peak height (set point) of a particular wavelength emission peak of the optical emission spectrum of the plasma and maintained constant throughout the film deposition process via the closed loop controller. The saturation magnetization of the Fe-N films initially increased with the increase of N content in the plasma (set point), reaching maximum at set point around 40 and then decreased with further increase of nitrogen. The nitrogen content of the films with maximum 4πMs was about 4.26 at%. The major phase of the as-deposited Fe-N films, analyzed by X-ray diffraction was α-Fe. Minor diffraction peaks at 2θ of 28.9° corresponding to α″-Fe16N2 phase were present for Fe-N films, which might be responsible for the increase of saturation magnetization of the Fe-N films.

KW - Fe-N films

KW - Reactive sputtering

KW - Saturation magnetization

KW - Soft magnetic properties

UR - http://www.scopus.com/inward/record.url?scp=0035386312&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035386312&partnerID=8YFLogxK

U2 - 10.1109/20.951149

DO - 10.1109/20.951149

M3 - Conference article

AN - SCOPUS:0035386312

SN - 0018-9464

VL - 37

SP - 2284

EP - 2287

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

IS - 4 I

T2 - 8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag)

Y2 - 7 January 2001 through 11 January 2001

ER -

Reactive sputtering of high moment Fe-N soft magnetic films with in-situ plasma diagnosis and control

Abstract

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