Real-time observation of atomic layer deposition inhibition: Metal oxide growth on self-assembled alkanethiols

Jason R. Avila; Erica J. Demarco; Jonathan Daniel Emery; Omar k Farha; Michael J. Pellin; Joseph T Hupp; Alex B F Martinson

doi:10.1021/am503008j

Real-time observation of atomic layer deposition inhibition: Metal oxide growth on self-assembled alkanethiols

Jason R. Avila, Erica J. Demarco, Jonathan Daniel Emery, Omar k Farha, Michael J. Pellin, Joseph T Hupp, Alex B F Martinson^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

70 Scopus citations

Abstract

Through in situ quartz crystal microbalance (QCM) monitoring, we resolve the growth of a self-assembled monolayer (SAM) and subsequent metal oxide deposition with high resolution. We introduce the fitting of mass deposited during each atomic layer deposition (ALD) cycle to an analytical island-growth model that enables quantification of growth inhibition, nucleation density, and the uninhibited ALD growth rate. A long-chain alkanethiol was self-assembled as a monolayer on gold-coated quartz crystals in order to investigate its effectiveness as a barrier to ALD. Compared to solution-loading, vapor-loading is observed to produce a SAM with equal or greater inhibition ability in minutes vs days. The metal oxide growth temperature and the choice of precursor also significantly affect the nucleation density, which ranges from 0.001 to 1 sites/nm². Finally, we observe a minimum 100 cycle inhibition of an oxide ALD process, ZnO, under moderately optimized conditions.

Original language	English (US)
Pages (from-to)	11891-11898
Number of pages	8
Journal	ACS Applied Materials and Interfaces
Volume	6
Issue number	15
DOIs	https://doi.org/10.1021/am503008j
State	Published - Aug 13 2014

Keywords

alkanethiol
analytical methods
atomic layer deposition
in situ
quartz crystal microbalance
self-assembled monolayers

ASJC Scopus subject areas

General Materials Science

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10.1021/am503008j

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title = "Real-time observation of atomic layer deposition inhibition: Metal oxide growth on self-assembled alkanethiols",

abstract = "Through in situ quartz crystal microbalance (QCM) monitoring, we resolve the growth of a self-assembled monolayer (SAM) and subsequent metal oxide deposition with high resolution. We introduce the fitting of mass deposited during each atomic layer deposition (ALD) cycle to an analytical island-growth model that enables quantification of growth inhibition, nucleation density, and the uninhibited ALD growth rate. A long-chain alkanethiol was self-assembled as a monolayer on gold-coated quartz crystals in order to investigate its effectiveness as a barrier to ALD. Compared to solution-loading, vapor-loading is observed to produce a SAM with equal or greater inhibition ability in minutes vs days. The metal oxide growth temperature and the choice of precursor also significantly affect the nucleation density, which ranges from 0.001 to 1 sites/nm2. Finally, we observe a minimum 100 cycle inhibition of an oxide ALD process, ZnO, under moderately optimized conditions.",

keywords = "alkanethiol, analytical methods, atomic layer deposition, in situ, quartz crystal microbalance, self-assembled monolayers",

author = "Avila, {Jason R.} and Demarco, {Erica J.} and Emery, {Jonathan Daniel} and Farha, {Omar k} and Pellin, {Michael J.} and Hupp, {Joseph T} and Martinson, {Alex B F}",

year = "2014",

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doi = "10.1021/am503008j",

language = "English (US)",

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publisher = "American Chemical Society",

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T1 - Real-time observation of atomic layer deposition inhibition

T2 - Metal oxide growth on self-assembled alkanethiols

AU - Avila, Jason R.

AU - Demarco, Erica J.

AU - Emery, Jonathan Daniel

AU - Farha, Omar k

AU - Pellin, Michael J.

AU - Hupp, Joseph T

AU - Martinson, Alex B F

PY - 2014/8/13

Y1 - 2014/8/13

N2 - Through in situ quartz crystal microbalance (QCM) monitoring, we resolve the growth of a self-assembled monolayer (SAM) and subsequent metal oxide deposition with high resolution. We introduce the fitting of mass deposited during each atomic layer deposition (ALD) cycle to an analytical island-growth model that enables quantification of growth inhibition, nucleation density, and the uninhibited ALD growth rate. A long-chain alkanethiol was self-assembled as a monolayer on gold-coated quartz crystals in order to investigate its effectiveness as a barrier to ALD. Compared to solution-loading, vapor-loading is observed to produce a SAM with equal or greater inhibition ability in minutes vs days. The metal oxide growth temperature and the choice of precursor also significantly affect the nucleation density, which ranges from 0.001 to 1 sites/nm2. Finally, we observe a minimum 100 cycle inhibition of an oxide ALD process, ZnO, under moderately optimized conditions.

AB - Through in situ quartz crystal microbalance (QCM) monitoring, we resolve the growth of a self-assembled monolayer (SAM) and subsequent metal oxide deposition with high resolution. We introduce the fitting of mass deposited during each atomic layer deposition (ALD) cycle to an analytical island-growth model that enables quantification of growth inhibition, nucleation density, and the uninhibited ALD growth rate. A long-chain alkanethiol was self-assembled as a monolayer on gold-coated quartz crystals in order to investigate its effectiveness as a barrier to ALD. Compared to solution-loading, vapor-loading is observed to produce a SAM with equal or greater inhibition ability in minutes vs days. The metal oxide growth temperature and the choice of precursor also significantly affect the nucleation density, which ranges from 0.001 to 1 sites/nm2. Finally, we observe a minimum 100 cycle inhibition of an oxide ALD process, ZnO, under moderately optimized conditions.

KW - alkanethiol

KW - analytical methods

KW - atomic layer deposition

KW - in situ

KW - quartz crystal microbalance

KW - self-assembled monolayers

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EP - 11898

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 15

ER -

Real-time observation of atomic layer deposition inhibition: Metal oxide growth on self-assembled alkanethiols

Abstract

Keywords

ASJC Scopus subject areas

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