Recent progress in soft lithography

John A. Rogers*, Ralph G. Nuzzo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

368 Scopus citations

Abstract

The recent research trends in the field of soft lithography, with a focus on trends in research and steps toward commercialization are discussed. It also provides a brief account of efforts to innovate and move certain of these techniques out of the laboratory and into commercial manufacturing settings. The earliest soft-lithography method represents a form of contact printing that uses a high-resolution elastomeric stamp with a chemical ink capable of forming a self-assembled monolayer (SAM) on a target substrate. These techniques have achieved widespread use in academic and industrial laboratories around the world for applications in fields ranging from photonics and biotechnology to microfluidics and electronics.

Original languageEnglish (US)
Pages (from-to)50-56
Number of pages7
JournalMaterials Today
Volume8
Issue number2
DOIs
StatePublished - Feb 2005

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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