Record charge carrier diffusion length in colloidal quantum dot solids via mutual dot-to-dot surface passivation

Graham H. Carey, Larissa Levina, Riccardo Comin, Oleksandr Voznyy, Edward H. Sargent*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

113 Scopus citations

Abstract

Through a combination of chemical and mutual dot-to-dot surface passivation, high-quality colloidal quantum dot solids are fabricated. The joint passivation techniques lead to a record diffusion length for colloidal quantum dots of 230 ± 20 nm. The technique is applied to create thick photovoltaic devices that exhibit high current density without losing fill factor.

Original languageEnglish (US)
Pages (from-to)3325-3330
Number of pages6
JournalAdvanced Materials
Volume27
Issue number21
DOIs
StatePublished - Jun 1 2015

Keywords

  • colloidal quantum dots
  • diffusion length
  • surface passivation
  • surface-to-volume ratio

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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