Regularization of pattern formation in metal/SMP bi-layer structures

Zhongbi Chen*, Yun Young Kim, Qiaojian Huang, Sridhar Krishnaswamy

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

In this paper, we demonstrate a fabrication method for ordered self-assembly using pre-programmed shape memory polymer (SMP) as the substrate in an organic-inorganic bi-layer structure. By heating the hybrid structure above the SMP's shape recovery temperature, the substrate expands because of positive CTE in one direction, while in the perpendicular direction it shrinks due to shape memory effect overpowering thermal expansion. Consequently, the thin film is subjected to an orthogonal compression-tension stress field and forms unidirectional wavy patterns. We further validate our conceptual design by adjusting the strain level of pre-programmed SMP substrates. The present study is expected to offer a convenient and simple path of fabricating unidirectional wavy patterns. Moreover, selective growth and ordering of patterns can become possible.

Original languageEnglish (US)
Title of host publicationSensors and Smart Structures Technologies for Civil, Mechanical, and Aerospace Systems 2011
Volume7981
DOIs
StatePublished - May 26 2011
EventSensors and Smart Structures Technologies for Civil, Mechanical, and Aerospace Systems 2011 - San Diego, CA, United States
Duration: Mar 7 2011Mar 10 2011

Other

OtherSensors and Smart Structures Technologies for Civil, Mechanical, and Aerospace Systems 2011
CountryUnited States
CitySan Diego, CA
Period3/7/113/10/11

Keywords

  • anisotropic patterns
  • shape memory polymer (SMP)
  • thin film
  • wrinkles

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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