REVIEW OF ION SURFACE INTERACTIONS DURING CRYSTAL GROWTH FROM THE VAPOR PHASE.

J. E. Greene*, S. A. Barnett

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

The objective of this paper is to provide an overview of important ion/surface effects during thin film growth by a variety of vapor phase techniques including glow discharge and ion beam sputtering, accelerated-beam molecular beam epitaxy, and plasma-assisted chemical vapor deposition.

Original languageEnglish (US)
Title of host publicationUnknown Host Publication Title
EditorsToshinori Takagi
Pages1049-1060
Number of pages12
StatePublished - Dec 1 1983

ASJC Scopus subject areas

  • Engineering(all)

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