The objective of this paper is to provide an overview of important ion/surface effects during thin film growth by a variety of vapor phase techniques including glow discharge and ion beam sputtering, accelerated-beam molecular beam epitaxy, and plasma-assisted chemical vapor deposition.
|Original language||English (US)|
|Title of host publication||Unknown Host Publication Title|
|Number of pages||12|
|State||Published - Dec 1 1983|
ASJC Scopus subject areas