Abstract
The objective of this paper is to provide an overview of important ion/surface effects during thin film growth by a variety of vapor phase techniques including glow discharge and ion beam sputtering, accelerated-beam molecular beam epitaxy, and plasma-assisted chemical vapor deposition.
Original language | English (US) |
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Title of host publication | Unknown Host Publication Title |
Editors | Toshinori Takagi |
Pages | 1049-1060 |
Number of pages | 12 |
State | Published - Dec 1 1983 |
ASJC Scopus subject areas
- Engineering(all)