Abstract
Molecularly precise nanopatterning is demonstrated for a saturated organic monolayer on the Si(100) surface using room temperature ultra-high vacuum scanning tunneling microscopy. In particular, feedback controlled lithography enables the clean desorption of individual molecules from a highly-ordered cyclopentene monolayer at moderate negative sample bias, resulting in the exposure of isolated silicon dimers on an otherwise organically passivated surface. The quality and uniformity of the cyclopentene passivation layer is also quantified with X-ray photoelectron spectroscopy following exposure to ambient conditions, revealing that complete formation of the native oxide on silicon is suppressed for time scales exceeding 100 days.
| Original language | English (US) |
|---|---|
| Article number | 243106 |
| Journal | Applied Physics Letters |
| Volume | 102 |
| Issue number | 24 |
| DOIs | |
| State | Published - Jun 17 2013 |
Funding
This work was supported by the Department of Energy (Award No. DE-FG02-09ER16109) and a W. M. Keck Foundation Science and Engineering Grant. XPS experiments were performed in the Keck-II facility of the NUANCE Center at Northwestern University. NUANCE is supported by the NSF-NSEC, NSF-MRSEC, Keck Foundation, State of Illinois, and Northwestern University. The authors thank J. W. Lyding for the use of his STM control software.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)