Room temperature nanofabrication of atomically registered heteromolecular organosilicon nanostructures using multistep feedback controlled lithography

The nanofabrication and characterization of atomically registered heteromolecular organosilicon nanostructures at room temperature were investigated using ultrahigh vaccum scanning tunneling microscopy. The individual 2, 2, 6, 6-tetramethyl1-1-piperidinyloxy (TEMPO) free radical molecules at opposite ends of the same dimer row on the Si(100)-2×1:H surface were patterned using a feedback controlled lithography (FCL). FCL is also applied to remove individual hydrogen atom from the surface with atomic precision. The multistep FCL is also considered as an effective means for fabricating prototype molecular-scale electronic and mechanical devices on Si(100) surface.