Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

T. Jurca, A. W. Peters, A. R. Mouat, O. K. Farha, J. T. Hupp, Tracy Lynn Lohr, Massimiliano Delferro, T. J. Marks*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations


The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

Original languageEnglish (US)
Pages (from-to)1172-1178
Number of pages7
JournalDalton Transactions
Issue number4
StatePublished - 2017

ASJC Scopus subject areas

  • Inorganic Chemistry


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