Abstract
The self patterning behavior of a system based on block molecules that aggregate into clusters with dimensions on the order of a few nanometers was reported. These materials self pattern on oxidized silicon surfaces into distinct structures with x-y maps which have been observed in other materials but with the characteristic feature of having a fixed height equal to that of the molecular cluster.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 397 |
| Number of pages | 1 |
| Journal | American Chemical Society, Polymer Preprints, Division of Polymer Chemistry |
| Volume | 40 |
| Issue number | 1 |
| State | Published - Mar 1999 |
| Event | Proceedings of the 1999 ACS Anaheim Meeting - Anaheim, CA, USA Duration: Mar 21 1999 → Mar 25 1999 |
ASJC Scopus subject areas
- Polymers and Plastics