Self patterning in supramolecular and templated materials

S. I. Stupp*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


The self patterning behavior of a system based on block molecules that aggregate into clusters with dimensions on the order of a few nanometers was reported. These materials self pattern on oxidized silicon surfaces into distinct structures with x-y maps which have been observed in other materials but with the characteristic feature of having a fixed height equal to that of the molecular cluster.

Original languageEnglish (US)
Number of pages1
JournalAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Issue number1
StatePublished - Mar 1 1999
EventProceedings of the 1999 ACS Anaheim Meeting - Anaheim, CA, USA
Duration: Mar 21 1999Mar 25 1999

ASJC Scopus subject areas

  • Polymers and Plastics


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