Abstract
We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA methods. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.
Original language | English (US) |
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Pages (from-to) | 11-19 |
Number of pages | 9 |
Journal | CMES - Computer Modeling in Engineering and Sciences |
Volume | 1 |
Issue number | 1 |
State | Published - Dec 1 2000 |
Keywords
- Anisotropic etching
- Cellular automata
- Continuous cellular automata
- Etching simulation
ASJC Scopus subject areas
- Software
- Modeling and Simulation
- Computer Science Applications