Simulation of anisotropic crystalline etching using a continuous cellular automata algorithm

Zhenjun Zhu, Chang Liu

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA methods. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.

Original languageEnglish (US)
Pages (from-to)11-19
Number of pages9
JournalCMES - Computer Modeling in Engineering and Sciences
Volume1
Issue number1
StatePublished - Dec 1 2000

Keywords

  • Anisotropic etching
  • Cellular automata
  • Continuous cellular automata
  • Etching simulation

ASJC Scopus subject areas

  • Software
  • Modeling and Simulation
  • Computer Science Applications

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